原位程序升温脱附(TPD)方法的建立及其应用实例

Establishment and Application of in situ Temperature Programmed Desorption (TPD) for XPS Spectrometer

摘要: 介绍了在VGESCALAB210电子能谱仪上自己研制组装的用于研究单晶金属表面吸附层的原位TPD装置.研制的单晶样品台采用钽丝加热,最高加热速率可达30k/s,线性升温范围-100～1000℃,最高可达1000℃以上.同时介绍了该TPD装置成功地应用于Pd(111)面上的C*O/CO同位素交换吸附实验的应用实例.

Abstract: The establishment of the in situ Temperature Programmed Desorption (TPD) system for VG ESCALAB 210 spectrometer was described,which can be used for the investigation of the course of adsorption and desorption on the surface of metal crystalline.The crystal samples are linearly heated from -100℃ to 1000℃ by Tantalum wire.The highest heating rate and temperature are 30K/s and up to 1000℃, respectively.The system has been.used for the investigation of the isotope exchange (C^*O/CO) on the face of Pd(111).